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Fabrication of silicon devices by ion implantationIon beam implantation method for fabrication of automatic transistors and integrated circuits
Document ID
19670022238
Acquisition Source
Legacy CDMS
Document Type
Other
Authors
Winkler, C. E. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
August 3, 2013
Publication Date
June 1, 1967
Subject Category
Electronic Equipment
Accession Number
67N31567
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Keywords
IMPLANTATION
MICROELECTRONICS
ION BEAM
MANUFACTURING
INTEGRATED CIRCUIT
FIELD EFFECT TRANSISTOR /FET/
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