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Evidence against focused chains in high-yield copper sputtering.Yield and angular distribution of cesium ion- sputtered copper, noting dependence on angle of incidence, target temperature and energy
Document ID
19670052327
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
doi:10.1103/PhysRev.157.241
Authors
Olson, N. T.
Smith, H. P., Jr.
Date Acquired
August 3, 2013
Publication Date
May 10, 1967
Publication Information
Publication: PHYSICAL REVIEW
Subject Category
Physics, Solid-State
Accession Number
67A31056
Distribution Limits
Public
Copyright
Other
Keywords
ION BEAM
COPPER
ANGULAR DISTRIBUTION
SPUTTERING

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