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Improved vacuum deposition apparatusImproved apparatus enables vacuum deposition of thick metal films on the inside surface of a cylinder. The evaporant is deposited to a uniform thickness and distribution on the inside surface of the substrate without imperfections that would otherwise result from droplet formation.
Document ID
19690000361
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Erpenbach, H.
Date Acquired
August 5, 2013
Publication Date
September 1, 1969
Subject Category
Physical Sciences
Report/Patent Number
NPO-11009
Report Number: NPO-11009
Accession Number
69B10365
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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