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Electromagnetic simulation of microwave backscatter from the ocean surface - A feasibility studyPhotochemical etching is most successful method for obtaining simulated microwave backscatter pattern from ocean surface. Process is adaptable to integrated circuit and thin film semiconductor fabrications. The attained horizontal resolution of 10 should improve with equipment refinement.
Document ID
19710000016
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Ward, R. B. (LOCKHEED MISSILES AND SPACE CO.)
Date Acquired
August 6, 2013
Publication Date
January 1, 1971
Subject Category
Electronic Components And Circuits
Report/Patent Number
MFS-20476
Report Number: MFS-20476
Accession Number
71B10016
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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