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Vacuum deposition apparatus PatentDescribing apparatus used in vacuum deposition of thin film inductive windings for spacecraft microcircuitry
Document ID
19710008172
Acquisition Source
Legacy CDMS
Document Type
Other - Other
Authors
Adams, G. D. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
August 6, 2013
Publication Date
March 24, 1970
Subject Category
Machine Elements And Processes
Report/Patent Number
Patent Application Number: US-PATENT-APPL-SN-577115
Patent Number: NASA-CASE-XMF-01667
Patent Number: US-PATENT-3,502,051
Accession Number
71N17647
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-XMF-01667|US-PATENT-3,502,051
Patent Application
US-PATENT-APPL-SN-577115

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