NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Collections About News Help Login

Press Enter or click the Search button to begin your search.

Back to Results
Ion implantation damage effects in siliconIon implantation lattice damage effects in crystalline silicon with allowance for optical reflectivity, considering annealing temperature and amorphous layer formation
Document ID
19710038365
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Eberle, D. E.
Date Acquired
August 6, 2013
Publication Date
December 1, 1970
Subject Category
Physics, Solid-State
Meeting Information
Meeting: ANNUAL CONFERENCE ON NUCLEAR AND SPACE RADIATION EFFECTS
Location: LA JOLLA, CA
Start Date: July 21, 1970
End Date: July 23, 1970
Sponsors: INST. OF ELECTRICAL AND ELECTRONICS ENGINEERS
Accession Number
71A19062
Distribution Limits
Public
Copyright
Other

Available Downloads

There are no available downloads for this record.

Related Records

There are no records associated with this record.
No Preview Available