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Dual field alignment display and control for electron micropattern generatorApplication of electron beam lithography to replace photolithography process in fabrication of integrated circuits is discussed. Procedure for using electron beam lithography equipment is described. Diagram of electron micropattern generator is provided.
Document ID
19720000645
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Malmberg, P. R. (Westinghouse)
Okeeffe, T. W. (Westinghouse)
Date Acquired
August 6, 2013
Publication Date
October 1, 1972
Subject Category
Electronic Components And Circuits
Report/Patent Number
MFS-22118
Report Number: MFS-22118
Accession Number
72B10646
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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