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Two-speed deflection system for electron micropattern generatorDevelopment of dual speed deflection system for electron beam micropattern generator system is discussed. Factors affecting application of electron beam lithography are analyzed. Procedure for using two speed deflection system is described.
Document ID
19720000667
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Malmberg, P. R. (Westinghouse)
Date Acquired
August 6, 2013
Publication Date
October 1, 1972
Subject Category
Electronic Systems
Report/Patent Number
MFS-22117
Report Number: MFS-22117
Accession Number
72B10668
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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