Aluminide coatings for nickel base alloys

The metalliding process was used to aluminide IN-100 and TD NiCr. Aluminum was deposited over a broad range of deposition rates, with two types of coating structures resulting. Chromium, silicon, titanium and yttrium were also individually deposited simutaneously with aluminum on IN-100. None of these had a marked effect on the oxidation resistance of the aluminide coating. Porosity-free aluminide coatings with good oxidation resistance were formed on TD NiCr providing the aluminum concentration did not exceed 8 percent, the limit of solubility in the gamma phase.