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Mask and pattern characteristicsThe use of the mask and pattern facility to include information on equipment accuracy, limitations, and pattern making capabilities is discussed. An insight is provided into potential areas of pattern applications, the sequence of mask making, as well as possible inputs and outputs available to the user.
Document ID
19720023638
Acquisition Source
Legacy CDMS
Document Type
Technical Memorandum (TM)
Authors
Routh, D. E. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
September 2, 2013
Publication Date
August 1, 1972
Subject Category
Facilities, Research, And Support
Report/Patent Number
NASA-TM-X-64688
Report Number: NASA-TM-X-64688
Accession Number
72N31288
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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