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Thick film silicon growth techniquesSilicon ribbon growth experiments were conducted using orifices (dies) fabricated from SiC-SiO2 mixtures, fused quartz, SiC, and fine-grained, high density graphite. The best results were obtained from graphite dies. A number of different approaches was tried in modifying the thermal gradient in the dies and in holding the dies. The best results here were obtained from a 0.25-in. thick Mo disc holding a graphite die directly and fitting the die quite closely. Ribbon growths as wide as 9 mm were obtained, while the longest ribbon was 450 x 3.5 x 0.5 mm. Resistivities of ribbons grown from graphite dies have been measured over the range of 0.03 to 1.6 ohm-cm. Some thoughts and literature findings are presented regarding refractory oxide materials as potential orifices.
Document ID
19720025068
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Bates, H. E.
(Tyco Labs., Inc. Waltham, MA, United States)
Cocks, F. H.
(Tyco Labs., Inc. Waltham, MA, United States)
Mlavsky, A. I.
(Tyco Labs., Inc. Waltham, MA, United States)
Wald, F.
(Tyco Labs., Inc. Waltham, MA, United States)
Date Acquired
August 6, 2013
Publication Date
August 31, 1972
Subject Category
Physics, Solid-State
Report/Patent Number
QPR-2
NASA-CR-128415
Report Number: QPR-2
Report Number: NASA-CR-128415
Accession Number
72N32718
Funding Number(s)
CONTRACT_GRANT: NAS7-100
CONTRACT_GRANT: JPL-953365
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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