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Effects of positive ion implantation into antireflection coating of silicon solar cellsThe state of technological development of Si solar cells for highest obtained efficiency and radiation resistance is summarized. The various theoretical analyses of Si solar cells are reviewed. It is shown that factors controlling blue response are carrier diffusion length, surface recombination, impurity concentration profile in surface region, high level of surface impurity concentration (degeneracy), reflection coefficient of oxide, and absorption coefficient of Si. The theory of ion implantation of charge into the oxide antireflection coating is developed and side effects are discussed. The experimental investigations were directed at determining whether the blue response of Si solar cells could be improved by phosphorus ion charges introduced into the oxide antireflection coating.
Document ID
19730010332
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Middleton, A. E.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Harpster, J. W.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Collis, W. J.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Kim, C. K.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Date Acquired
September 2, 2013
Publication Date
June 24, 1971
Subject Category
Auxiliary Systems
Report/Patent Number
NASA-CR-131090
Report Number: NASA-CR-131090
Accession Number
73N19059
Funding Number(s)
CONTRACT_GRANT: NAS7-100
CONTRACT_GRANT: JPL-953042
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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