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Light intensity strain analysisA process is described for the analysis of the strain field of structures subjected to large deformations involving a low modulus substrate having a high modulus, relatively thin coating. The optical properties of transmittance and reflectance are measured for the coated substrate while stressed and unstressed to indicate the strain field for the coated substrate.
Document ID
19730012013
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Williams, J. G. (NASA Langley Research Center Hampton, VA, United States)
Date Acquired
September 2, 2013
Publication Date
February 13, 1973
Subject Category
Structural Mechanics
Report/Patent Number
Patent Number: NASA-CASE-LAR-10765-1
Patent Application Number: US-PATENT-APPL-SN-138230
Patent Number: US-PATENT-3,715,915
Accession Number
73N20740
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-LAR-10765-1|US-PATENT-3,715,915
Patent Application
US-PATENT-APPL-SN-138230

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