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Star tracking reticlesA method for the production of reticles, particularly those for use in outer space, where the product is a quartz base coated with highly adherent layers of chromium, chromium-silver, and silver vacuum deposited through a mask, and then coated with an electrodeposit of copper from a copper sulfate solution followed by an electrodeposit of black chromium is described. The masks are produced by coating a beryllium-copper alloy substrate with a positive working photoresist, developing the photoresist, according to a pattern to leave a positive mask, plating uncoated areas with gold, removing the photoresist, coating the substrate with a negative working photoresist, developing the negative working photoresist to expose the base metal of the pattern, and chemically etching the unplated side of the pattern to produce the mask.
Document ID
19730023588
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Smith, W. O. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Toft, A. R. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Date Acquired
September 2, 2013
Publication Date
September 18, 1973
Subject Category
Instrumentation And Photography
Report/Patent Number
Patent Number: NASA-CASE-GSC-11188-1
Patent Application Number: US-PATENT-APPL-SN-80029
Patent Application Number: US-PATENT-APPL-SN-244440
Patent Number: US-PATENT-3,759,672
Accession Number
73N32320
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-GSC-11188-1|US-PATENT-3,759,672
Patent Application
US-PATENT-APPL-SN-80029|US-PATENT-APPL-SN-244440

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