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Low-temperture electrostatic silicon-to-silicon seals using sputtered borosilicate glassSilicon members are hermetically sealed to each other. Process produces no measurable deformation of silicon surfaces and is compatible with package designs of tight tolerance. Seals have been made with glass coatings in 10-mm to 20-mm thickness range without any prior annealing of coated silicon substrates.
Document ID
19740000263
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Hardesty, C. A.
(Res. Triangle Inst.)
Brooks, A. D.
(Res. Triangle Inst.)
Donovan, R. P.
Date Acquired
August 7, 2013
Publication Date
January 1, 1975
Subject Category
Fabrication Technology
Report/Patent Number
LAR-11589
Report Number: LAR-11589
Accession Number
74B10263
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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