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Development of sputtered techniques for thrust chambers, task 1Filler materials proposed for use in the sputter fabrication regeneratively cooled thrust chambers were evaluated. Low melting castable alloys, CERROBEND. CERROCAST, and CERROTRU, slurry applied SERMETEL 481 and flame-sprayed aluminum were investigated as filler materials. Sputter deposition from a cylindrical cathode inverted magnestron was used to apply an OFHC copper closeout layer to filled OFHC copper ribbed-wall cylindrical substrates. The sputtered closeout layer structure was evaluated with respect to filler material contamination, predeposition machining and finishing operations, and deposition parameters. The application of aluminum by flame-spraying resulted in excessiver filler porosity. Though the outgassing from this porosity was found to be detrimental to the closeout layer structure, bond strengths in excess of 10,500 psi were achieved. Removal of the aluminum from the grooves was readily accomplished by leaching in a 7.0 molar solution of sodium hydroxide at 353 K. Of the other filler materials evaluated, CERROTRU was found to be the most suitable material with respect to completely filling the ribbed-wall cylinders and vacuum system compatibility. However, bond contamination resulted in low closeout layer bond strength with the CERROTRU filler. CERROBEND, CERROCAST, and SERMETEL 481 were found to be unacceptable as filler materials.
Document ID
19740020846
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Mullaly, J. R.
(Pratt and Whitney Aircraft West Palm Beach, FL, United States)
Schmid, T. E.
(Pratt and Whitney Aircraft West Palm Beach, FL, United States)
Hecht, R. J.
(Pratt and Whitney Aircraft West Palm Beach, FL, United States)
Date Acquired
September 3, 2013
Publication Date
March 1, 1974
Subject Category
Machine Elements And Processes
Report/Patent Number
NASA-CR-134629
FR-6353-VOL-1
Report Number: NASA-CR-134629
Report Number: FR-6353-VOL-1
Accession Number
74N28959
Funding Number(s)
CONTRACT_GRANT: NAS3-17792
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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