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High reliability sheathed, beryllia insulated, tungsten-rhenium alloy thermocouple assemblies; their fabrication and EMF stabilityTantalum sheathed, BeO insulated, W-3% Re/W-25% Re thermocouple assemblies were fabricated and their emf drift determined during 2059 hours of exposure at 2073 K in a gaseous helium environment. The sheathed thermocouple assemblies were constructed from aged thermoelements, specially heat-treated BeO insulators, and specially cleaned and etched tantalum sheaths. Their thermal emf drifts ranged from the equivalent of only -0.3 to -0.8 K drift per 1000 hours of exposure at 2073 K. No evidence of any gross chemical attack or degradation of the component materials was found. The emf drift and material behavior of some unsheathed, BeO insulated, W-3% Re/W-25% Re thermocouples at 2250 and 2400 K were also determined. Unsheathed thermocouples tested in an argon environment at 2250 K for 1100 hours and at 2400 K for 307 hours exhibited changes in thermal emf that typically ranged from the equivalent of a few degrees K to as much as +11 K. Post-test examinations of these thermocouples revealed some undesirable material degradation and interaction which included erosion of the BeO insulators and contamination of the thermoelements by tantalum from the tantalum blackbody enclosure in which the thermocouples were contained.
Document ID
19740021662
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Burns, G. W.
(National Bureau of Standards Washington, DC, United States)
Hurst, W. S.
(National Bureau of Standards Washington, DC, United States)
Scroger, M. G.
(National Bureau of Standards Washington, DC, United States)
Date Acquired
September 3, 2013
Publication Date
June 1, 1974
Subject Category
Instrumentation And Photography
Report/Patent Number
NBSIR-74-447
NASA-CR-134549
Report Number: NBSIR-74-447
Report Number: NASA-CR-134549
Accession Number
74N29775
Funding Number(s)
CONTRACT_GRANT: NASA ORDER C-61545-B
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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