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Inhibiting Kirkendall void growth in welded bimetallic structuresTechnique employs pre-aged, void-free junction composed of parent materials. Basic process for Kirkendall void inhibition can be applied to thermionic power systems, high temperature seals, high temperature junctions between any two metals of differing melting points where Kirkendall void formation would be detrimental.
Document ID
19750000006
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Arcella, F. G. (Westinghouse Astronucl. Lab.)
Lessmann, G. A. (Westinghouse Astronucl. Lab.)
Lindberg, R. A.
Date Acquired
August 8, 2013
Publication Date
March 1, 1975
Subject Category
Fabrication Technology
Report/Patent Number
LEW-11573
Report Number: LEW-11573
Accession Number
75B10006
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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