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Improved multiple-target sputtering equipmentSputtering chamber has been developed with multiple target. Several film layers can be deposited without repeated evacuation and refilling. Contamination through exposure to air is eliminated.
Document ID
19750000178
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Shima, R.
Date Acquired
August 8, 2013
Publication Date
August 1, 1975
Subject Category
Materials
Report/Patent Number
NPO-13345
Report Number: NPO-13345
Accession Number
75B10178
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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