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Diffusion length measurements using the scanning electron microscopeA measurement technique employing the scanning electron microscope is described in which values of the true bulk diffusion length are obtained. It is shown that surface recombination effects can be eliminated through the application of highly doped surface field layers. The influence of high injection level effects and low-high junction current generation on the resulting measurement was investigated. Close agreement is found between the diffusion lengths measured by this method and those obtained using a penetrating radiation technique.
Document ID
19750015942
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Weizer, V. G.
(NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 3, 2013
Publication Date
January 1, 1975
Subject Category
Quality Assurance And Reliability
Report/Patent Number
NASA-TM-X-71724
Report Number: NASA-TM-X-71724
Meeting Information
Meeting: Photovoltaic Specialists Conf.
Location: Phoenix, AZ
Country: United States
Start Date: May 6, 1975
End Date: May 8, 1975
Sponsors: IEEE
Accession Number
75N24014
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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