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Molecular beam generatorVacuum deposition generator has nozzle and aperature designed especially for beams of heavy organic molecules. Deposition rates are from 6 to 15 angstroms per minute.
Document ID
19760000353
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Richmond, R. G. (McDonnell-Douglas Corp.)
Allen, T. H. (McDonnell-Douglas Corp.)
Linford, R. M. F. (McDonnell-Douglas Corp.)
Wittman, J. E.
Date Acquired
August 8, 2013
Publication Date
January 1, 1977
Publication Information
Publication: NASA Tech Briefs
Volume: 1
Issue: 3
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
MSC-14996
Report Number: MSC-14996
ISSN: 0145-319X
Accession Number
76B10353
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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