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Crystal orientation for solid-state photolithographyMethod determines desirable direction to apply photoresist mask when fabricating semiconductor lasers. Method can be applied to finished wafer without affecting device yield.
Document ID
19760000582
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Marinelli, D. P. (RCA)
Date Acquired
August 8, 2013
Publication Date
March 1, 1977
Publication Information
Publication: NASA Tech Briefs
Volume: 1
Issue: 4
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
LAR-11940
ISSN: 0145-319X
Report Number: LAR-11940
Accession Number
76B10582
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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