Study of Al with a combined Auger electron spectrometer-ellipsometer system

Auger electron spectroscopy and ellipsometry were applied in order to measure the optical constants and study the surface chemistry of vapor-deposited Al films and high-purity bulk Al surfaces in situ under vacuum. The optical constants measured were compared with the extinction coefficient computed by the free-electron theory. The contamination of the clean Al surface was in the form of a metal oxide film. Auger electron spectroscopic measurements were used to establish the relationship between the Auger peaks of O (513 eV) and aluminum oxide (53 eV) and changes in the measured optical phase and film thickness. The free path length of the Al Auger electrons (67 eV) in the oxide film was determined, and it was shown that the amplitude of these peaks is a linear function of film thickness down to 0.6 A.