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Mask and display programProgram is used to create complex lines, shapes, circles and alpha-numeric characters rapidly and easily, and format them for use on some pattern generation. System is applicable as aid to designers of microelectronics, integrated optics, bubble memories and other devices requiring precise artwork.
Document ID
19770000355
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Routh, D. (Sperry Rand Corp.)
Woo, D. S.
Date Acquired
August 8, 2013
Publication Date
March 1, 1977
Publication Information
Publication: NASA Tech Briefs
Volume: 2
Issue: 4
ISSN: 0145-319X
Subject Category
Electronic Components And Circuits
Report/Patent Number
MFS-23625
ISSN: 0145-319X
Report Number: MFS-23625
Accession Number
77B10355
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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