High purity silica reflective heat shield development

Measurements were made of reflectance in the vacuum ultraviolet down to 0.15 micron. Scattering coefficients (S) and absorption coefficients (K) were also measured. These coefficients express the optical properties and are used directly in a thermodynamic analysis for sizing a heat shield. The effect of the thin silica melt layer formed during entry was also studied from the standpoint of trapped radiant energy.