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A backside illuminated 400 x 400 charge-coupled device imagerLarge-area backside illuminated charge-coupled device imagers have been fabricated using double level aluminum transfer electrode technology. Devices with 100 x 160 and 400 x 400 resolution elements have been fabricated using buried channel technology for high charge transfer efficiency. Detailed optical characterization has been performed on these imagers over the temperature range -40 to +24 C and at several operating frequencies between 10 kHz and 1 MHz.
Document ID
19770030086
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Antcliffe, G. A.
(Xerox Corp. El Segundo, Calif., United States)
Hornbeck, L. J.
(Texas Instruments, Inc. Dallas, TX, United States)
Chan, W. W.
(Texas Instruments, Inc. Dallas, TX, United States)
Walker, J. W.
(Texas Instruments, Inc. Dallas, TX, United States)
Rhines, W. C.
(Texas Instruments, Inc. Dallas, TX, United States)
Collins, D. R.
(Texas Instruments, Inc. Dallas, Tex., United States)
Date Acquired
August 9, 2013
Publication Date
November 1, 1976
Publication Information
Publication: IEEE Transactions on Electron Devices
Volume: ED-23
Subject Category
Electronics And Electrical Engineering
Accession Number
77A12938
Funding Number(s)
CONTRACT_GRANT: NAS7-100
Distribution Limits
Public
Copyright
Other

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