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Excimer lasersThe results of a two-year investigation into the possibility of developing continuous wave excimer lasers are reported. The program included the evaluation and selection of candidate molecular systems and discharge pumping techniques. The K Ar/K2 excimer dimer molecules and the xenon fluoride excimer molecule were selected for study; each used a transverse and capillary discharges pumping technique. Experimental and theoretical studies of each of the two discharge techniques applied to each of the two molecular systems are reported. Discharge stability and fluorine consumption were found to be the principle impediments to extending the XeF excimer laser into the continuous wave regime. Potassium vapor handling problems were the principal difficulty in achieving laser action on the K Ar/K2 system. Of the four molecular systems and pumping techniques explored, the capillary discharge pumped K Ar/K2 system appears to be the most likely candidate for demonstrating continuous wave excimer laser action primarily because of its predicted lower pumping threshold and a demonstrated discharge stability advantage.
Document ID
19780011537
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Palmer, A. J.
(Hughes Research Labs. Malibu, CA, United States)
Hess, L. D.
(Hughes Research Labs. Malibu, CA, United States)
Stephens, R. R.
(Hughes Research Labs. Malibu, CA, United States)
Pepper, D. M.
(Hughes Research Labs. Malibu, CA, United States)
Date Acquired
September 3, 2013
Publication Date
November 1, 1977
Subject Category
Lasers And Masers
Report/Patent Number
NASA-CR-155949
Report Number: NASA-CR-155949
Accession Number
78N19480
Funding Number(s)
CONTRACT_GRANT: NAS3-19707
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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