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Plasma cleaning deviceHigh vacuum cleaning of contaminated surfaces such as hydrocarbon containment films can be accomplished by a plasma cleaning device which includes a plasma discharge housing to permit generation of a plasma in an environment having a higher pressure than the surface which is to be cleaned. A ground electrode and a radio frequency electrode partially surround a quartz plasma tube, for the introduction of an ionizable gas. These electrodes ionize the gas and help generate the plasma. This plasma flows through a non-constrictive aperture, through the plasma discharge housing and then on to the contaminated surface.
Document ID
19780019970
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Shannon, R. L.
(Boeing Co. Seattle, United States)
Gillette, R. B.
(Boeing Co. Seattle, United States)
Date Acquired
September 3, 2013
Publication Date
May 9, 1978
Subject Category
Plasma Physics
Report/Patent Number
Patent Number: US-PATENT-4,088,926
Patent Number: NASA-CASE-MFS-22906-1
Patent Application Number: US-PATENT-APPL-SN-684807
Accession Number
78N27913
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-4,088,926|NASA-CASE-MFS-22906-1
Patent Application
US-PATENT-APPL-SN-684807
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