NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Press Enter or click the Search button to begin your search.

Back to Results
High temperature compressive cracking in hot-pressed silicon nitrideResults are presented for high-temperature (1370, 1430, 1540, 1590 C) slow-strain-rate compression tests on cylindrical specimens of hot-pressed Si3N4 of the HS-130 brand under various compressive loads. The results are presented in terms of number of longitudinal cracks, percent increase in diameter, percent decrease in length, and percent loss in weight. Scanning electron micrographs are presented of cylindrical surfaces of compression specimens tested at 1430 C for 640 MN/sq m and at 1590 C for 220 MN/sq m. As compared to results obtained by other investigators, it appears more likely that the cracks resulting from compressive loading are due to subcritical crack growth caused by circumferential tensile stresses acting across grain boundaries that contain a viscous silicate glass phase.
Document ID
19780054797
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Sanders, W. A.
(NASA Lewis Research Center Cleveland, Ohio, United States)
Date Acquired
August 9, 2013
Publication Date
June 1, 1978
Publication Information
Publication: American Ceramic Society
Subject Category
Nonmetallic Materials
Accession Number
78A38706
Distribution Limits
Public
Copyright
Other

Available Downloads

There are no available downloads for this record.
No Preview Available