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Ion beam technology applications studySpecific perceptions and possible ion beam technology applications were obtained as a result of a literature search and contact interviews with various institutions and individuals which took place over a 5-month period. The use of broad beam electron bombardment ion sources is assessed for materials deposition, removal, and alteration. Special techniques examined include: (1) cleaning, cutting, and texturing for surface treatment; (2) crosslinking of polymers, stress relief in deposited layers, and the creation of defect states in crystalline material by ion impact; and (3) ion implantation during epitaxial growth and the deposition of neutral materials sputtered by the ion beam. The aspects, advantages, and disadvantages of ion beam technology and the competitive role of alternative technologies are discussed.
Document ID
19790004713
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Sellen, J. M., Jr.
(TRW Defense and Space Systems Group Redondo Beach, CA, United States)
Zafran, S.
(TRW Defense and Space Systems Group Redondo Beach, CA, United States)
Komatsu, G. K.
(TRW Defense and Space Systems Group Redondo Beach, CA, United States)
Date Acquired
September 3, 2013
Publication Date
November 1, 1978
Subject Category
Nuclear And High-Energy Physics
Report/Patent Number
TRW-32100-6009-RU-00
NASA-CR-159437
Report Number: TRW-32100-6009-RU-00
Report Number: NASA-CR-159437
Accession Number
79N12884
Funding Number(s)
CONTRACT_GRANT: NAS3-21027
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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