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Laser-zone growth in a Ribbon-To-Ribbon (RTR) process. Silicon sheet growth development for the large area sheet task of the low-cost solar array projectA new calculation of the effects of thermal stresses during growth on silicon ribbon quality is reported. Thermal stress distributions are computed for ribbon growth under a variety of temperature profiles. A growth rate of 55 cu cm/min with a single ribbon was achieved. The growth of RTR ribbon with a fairly uniform parallel dendritic structure was demonstrated. Results with two approaches were obtained for reducing the Mo impurity level in polycrystalline feedstock. Coating the Mo substrate with Si3N4 does not effect thermal shear separation of the polyribbon; this process shows promise of improving cell efficiency and also increasing the useful life of the molybdenum substrate. A number of solar cells were fabricated on RTR silicon grown from CVD feedstock.
Document ID
19790006376
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Baghdadi, A.
(Motorola, Inc. Phoenix, AZ, United States)
Gurtler, R. W.
(Motorola, Inc. Phoenix, AZ, United States)
Legge, R.
(Motorola, Inc. Phoenix, AZ, United States)
Sopori, B.
(Motorola, Inc. Phoenix, AZ, United States)
Ellis, R. J.
(Motorola, Inc. Phoenix, AZ, United States)
Date Acquired
September 3, 2013
Publication Date
September 30, 1978
Subject Category
Energy Production And Conversion
Report/Patent Number
DOE/JPL-954376-78/4
REPT-2256/11
NASA-CR-158045
Report Number: DOE/JPL-954376-78/4
Report Number: REPT-2256/11
Report Number: NASA-CR-158045
Accession Number
79N14547
Funding Number(s)
PROJECT: PROJ. 2319-2325
OTHER: JPL-954376
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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