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Measuring radiation effects on MOS capacitorsElectron injection technique serves as powerful probe of trapped hole distribution after irradiation because it was determined that electrons only annihilate trapped holes. Other effects, such as other electron traps and interface state generation, are negligible in injection range used. Trap cross sections and densities indicate at least three trap species; interfacial species, dominant bulk species determined to tail off from silicon interface, and lower density and cross section species that may be distributed throughout bulk of oxide.
Document ID
19800000227
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Bakowski, M.
(Caltech)
Cockrum, R. H.
(Caltech)
Maserjian, J.
(Caltech)
Zamani, N.
(Caltech)
Date Acquired
August 10, 2013
Publication Date
September 1, 1980
Publication Information
Publication: NASA Tech Briefs
Volume: 5
Issue: 2
ISSN: 0145-319X
Subject Category
Mechanics
Report/Patent Number
NPO-14700
Report Number: NPO-14700
ISSN: 0145-319X
Accession Number
80B10227
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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