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CADAT integrated circuit artwork programVersatile, ready-to-use program (ARTWORK) converts artwork data into mask patterns. ARTWORK generates signals for controlling mask-fabricating equipment. Extensive utility package enables user to create new pattern libraries, develop and incorporate new cells, and perform systems orientation functions. Program is written in FORTRAN IV.
Document ID
19800000552
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Kvelthau, R. L. (M&S Computing, Inc.)
Date Acquired
August 10, 2013
Publication Date
April 1, 1981
Publication Information
Publication: NASA Tech Briefs
Volume: 5
Issue: 4
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
Report Number: MFS-25017
ISSN: 0145-319X
MFS-25017
Accession Number
80B10552
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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