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Automated Array Assembly Task In-depth Study of Silicon Wafer Surface TexturizingSeveral aspects of silicon wafer surface texturizing were studied. A low cost cleaning method that utilizes recycled Freon in an ultrasonic vapor degreaser to remove organic and inorganic contaminants from the surface of silicon wafers as received from silicon suppliers was investigated. The use of clean dry air and high throughout wafer batch drying techniques was shown to lower the cost of wafer drying. A two stage texturizing process was examined for suitability in large scale production. Also, an in-depth gettering study with the two stage texturizing process was performed for the enhancement of solar cell efficiency, minimization of current versus voltage curve dispersion, and improvement in process reproducibility. The 10% efficiency improvement goal was exceeded for the near term implementation of flat plate photovoltaic cost reduction.
Document ID
19800011338
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Jones, G. T.
(Sensor Technology, Inc. Chatsworth, CA, United States)
Rhee, S. S.
(Sensor Technology, Inc. Chatsworth, CA, United States)
Date Acquired
September 4, 2013
Publication Date
July 1, 1979
Subject Category
Energy Production And Conversion
Report/Patent Number
DOE/JPL-955266-79/2
NASA-CR-162883
Report Number: DOE/JPL-955266-79/2
Report Number: NASA-CR-162883
Accession Number
80N19618
Funding Number(s)
CONTRACT_GRANT: JPL-955266
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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