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A study of trends and techniques for space base electronicsFurnaces and photolithography related equipment were applied to experiments on double layer metal. The double layer metal activity emphasized wet chemistry techniques. By incorporating the following techniques: (1) ultrasonic etching of the vias; (2) premetal clean using a modified buffered hydrogen fluoride; (3) phosphorus doped vapor; and (4) extended sintering, yields of 98 percent were obtained using the standard test pattern. The two dimensional modeling problems have stemmed from, alternately, instability and too much computation time to achieve convergence.
Document ID
19810003816
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Trotter, J. D.
(Mississippi State Univ. Mississippi State, MS, United States)
Wade, T. E.
(Mississippi State Univ. Mississippi State, MS, United States)
Gassaway, J. D.
(Mississippi State Univ. Mississippi State, MS, United States)
Date Acquired
September 4, 2013
Publication Date
September 1, 1978
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
MSU-EE-QUAR-4-78
NASA-CR-161277
Report Number: MSU-EE-QUAR-4-78
Report Number: NASA-CR-161277
Accession Number
81N12327
Funding Number(s)
CONTRACT_GRANT: NAS8-26749
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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