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Sputtering and ion plating for aerospace applicationsSputtering and ion plating technologies are reviewed in terms of their potential and present uses in the aerospace industry. Sputtering offers great universality and flexibility in depositing any material or in the synthesis of new ones. The sputter deposition process has two areas of interest: thin film and fabrication technology. Thin film sputtering technology is primarily used for aerospace mechanical components to reduce friction, wear, erosion, corrosion, high temperature oxidation, diffusion and fatigue, and also to sputter-construct temperature and strain sensors for aircraft engines. Sputter fabrication is used in intricate aircraft component manufacturing. Ion plating applications are discussed in terms of the high energy evaporant flux and the high throwing power. Excellent adherence and 3 dimensional coverage are the primary attributes of this technology.
Document ID
19810011895
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Spalvins, T.
(NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 4, 2013
Publication Date
January 1, 1981
Subject Category
Mechanical Engineering
Report/Patent Number
NASA-TM-81726
E-778
Report Number: NASA-TM-81726
Report Number: E-778
Meeting Information
Meeting: Natl. Conf. of the Am. Electroplaters Soc.,
Location: Boston, MA
Country: United States
Start Date: June 28, 1981
End Date: July 2, 1981
Accession Number
81N20424
Funding Number(s)
PROJECT: RTOP 506-53-12
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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