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Ion source design for industrial applicationsThe design of broad-beam industrial ion sources is described. The approach used emphasizes refractory metal cathodes and permanent-magnet multipole discharge chambers. Design procedures and sample calculations are given for the discharge chamber, ion optics, cathodes, and magnetic circuit. Hardware designs are included for the isolator, cathode supports, anode supports, pole-piece assembly, and ion-optics supports. There are other ways of designing most ion source components, but the designs presented are representative of current technology and adaptable to a wide range of configurations.
Document ID
19810016343
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Kaufman, H. R.
(Colorado State Univ. Fort Collins, CO, United States)
Robinson, R. S.
(Colorado State Univ. Fort Collins, CO, United States)
Date Acquired
September 4, 2013
Publication Date
January 1, 1981
Subject Category
Atomic And Molecular Physics
Report/Patent Number
NASA-CR-165334
Report Number: NASA-CR-165334
Accession Number
81N24878
Funding Number(s)
CONTRACT_GRANT: NSG-3086
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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