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Effect of vacuum processing on outgassing within an orbiting molecular shieldThe limiting hydrogen number density in an orbiting molecular shield is highly dependent on the outgassing rates from the materials of construction for the shield, experimental apparatus, and other hardware contained within the shield. Ordinary degassing temperatures used for ultrahigh vacuum studies (less than 450 C) are not sufficient to process metals so that the contribution to the number density within the shield due to outgassing is less than the theoretically attainable level (approximately 200 per cu. cm). Pure aluminum and type 347 stainless steel were studied as candidate shield materials. Measurements of their hydrogen concentration and diffusion coefficients were made, and the effects of high temperature vacuum processing (greater than 600 C) on their resulting outgassing rates was determined. The densities in a molecular shield due to the outgassing from either metal were substantially less ( 0.003) than the density due to the ambient atomic hydrogen flux at an orbital altitude of 500 km.
Document ID
19820011516
Acquisition Source
Legacy CDMS
Document Type
Technical Publication (TP)
Authors
Outlaw, R. A.
(NASA Langley Research Center Hampton, VA, United States)
Date Acquired
September 4, 2013
Publication Date
March 1, 1982
Subject Category
Engineering (General)
Report/Patent Number
L-14987
NASA-TP-1980
Report Number: L-14987
Report Number: NASA-TP-1980
Accession Number
82N19390
Funding Number(s)
PROJECT: RTOP 506-55-43-01
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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