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Automated semiconductor vacuum chemical vapor deposition facilityA semiconductor vacuum chemical vapor deposition facility (totally automatic) was developed. Wafers arrived on an air track, automatically loaded into a furnace tube, processed, returned to the track, and sent on to the next operation. The entire process was controlled by a computer.
Document ID
19820012384
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Date Acquired
September 4, 2013
Publication Date
January 1, 1982
Subject Category
Inorganic And Physical Chemistry
Report/Patent Number
NAS 1.26:161269
NASA-CR-161269
Report Number: NAS 1.26:161269
Report Number: NASA-CR-161269
Accession Number
82N20258
Funding Number(s)
CONTRACT_GRANT: NAS8-31617
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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