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High purity low dislocation GaAs single crystalsRecent advances in GaAs bulk crystal growth using the LEC (liquid encapsulated Czochralski) technique are described. The dependence of the background impurity concentration and the dislocation density distribution on the materials synthesis and growth conditions were investigated. Background impurity concentrations as low as 4 x 10 to the 15th power were observed in undoped LEC GaAs. The dislocation density in selected regions of individual ingots was very low, below the 3000 cm .3000/sq cm threshold. The average dislocation density over a large annular ring on the wafers fell below the 10000/sq cm level for 3 inch diameter ingots. The diameter control during the program advanced to a diameter variation along a 3 inch ingot less than 2 mm.
Document ID
19820015156
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Chen, R. T.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Holmes, D. E.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Kirkpatrick, C. G.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Date Acquired
September 4, 2013
Publication Date
January 1, 1982
Subject Category
Solid-State Physics
Report/Patent Number
NAS 1.26:165593
NASA-CR-165593
ERC41054.36FR
Report Number: NAS 1.26:165593
Report Number: NASA-CR-165593
Report Number: ERC41054.36FR
Accession Number
82N23030
Funding Number(s)
CONTRACT_GRANT: NAS3-22224
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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