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Present growth technology of silicon germanium alloys and possible advantages of microgravity growthThe growth technology of Silicon-germanium (Si-Ge) alloys and the possible advantages of growth in microgravity is reviewed. The Si-Ge alloys have a continuous variation of bandgap energy from the germanium bandgap to the silicon bandgap. The unusual two slope behavior of Eg versus composition is due to the differences in the conduction band structure between Si and Ge. Below 17% (atomic), the germanium band structure dominates; and above it, the bands are "silicon like". It is found that the growth of Si-Ge alloys in microgravity is very attractive. In particular, the float zone method, in which a liquid zone of controlled starting composition, used to grow a large amount of useful alloy crystal. Large temperature gradients and relatively flat growth interfaces are necessary to obtain homogeneous crystal growth.
Document ID
19820018470
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Stafsudd, O. M.
(California Univ. Los Angeles, CA, United States)
Date Acquired
August 10, 2013
Publication Date
September 1, 1981
Publication Information
Publication: NASA. Marshall Space Flight Center Float Zone Workshop
Subject Category
Astronautics (General)
Accession Number
82N26346
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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