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High purity, low dislocation GaAs single crystalsLiquid encapsulated Czochralski crystal growth techniques for producing undoped, high resistivity, low dislocation material suitable for device applications is described. Technique development resulted in reduction of dislocation densities in 3 inch GaAs crystals. Control over the melt stoichiometry was determined to be of critical importance for the reduction of twinning and polycrystallinity during growth.
Document ID
19830011351
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Chen, R. T.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Holmes, D. E.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Kirkpatrick, C. G.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Date Acquired
September 4, 2013
Publication Date
February 1, 1983
Subject Category
Solid-State Physics
Report/Patent Number
NAS 1.26:16809
NASA-CR-168098
MRDC41054.59FR
Report Number: NAS 1.26:16809
Report Number: NASA-CR-168098
Report Number: MRDC41054.59FR
Accession Number
83N19622
Funding Number(s)
CONTRACT_GRANT: NAS3-22224
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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