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Ion beam sputter-etched ventricular catheter for hydrocephalus shuntA cerebrospinal fluid shunt in the form of a ventricular catheter for controlling the condition of hydrocephalus by relieving the excessive cerebrospinal fluid pressure is described. A method for fabrication of the catheter and shunting the cerebral fluid from the cerebral ventricles to other areas of the body is also considered. Shunt flow failure occurs if the ventricle collapse due to improper valve function causing overdrainage. The ventricular catheter comprises a multiplicity of inlet microtubules. Each microtubule has both a large openings at its inlet end and a multiplicity of microscopic openings along its lateral surfaces.
Document ID
19830013514
Document Type
Other - Patent
Authors
Banks, B. A. (NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 4, 2013
Publication Date
June 10, 1983
Subject Category
AEROSPACE MEDICINE
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-4,377,169|NASA-CASE-LEW-13107-1
Patent Application
US-PATENT-APPL-SN-272407

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