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Development of metallization process: FSA project, cell and module formation research areaThe use of CO in place of H2 for the reducing step did not appreciably increase solderability of interconnects. Cells were also made printing the pastes on top of ITO coatings. Some of these cells were the best electrically but the metallization was still not adhering. Sequential use of H2 and CO had no effect on adhesion (or lack of it).
Document ID
19830025059
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Garcia, A., III
(Spectrolab, Inc. Sylmar, CA, United States)
Date Acquired
September 4, 2013
Publication Date
May 1, 1983
Subject Category
Energy Production And Conversion
Report/Patent Number
DOE/JPL-956205-83/4
NAS 1.26:172969
QTPR-6329-12
JPL-9950-849
NASA-CR-172969
Report Number: DOE/JPL-956205-83/4
Report Number: NAS 1.26:172969
Report Number: QTPR-6329-12
Report Number: JPL-9950-849
Report Number: NASA-CR-172969
Accession Number
83N33330
Funding Number(s)
CONTRACT_GRANT: JPL-956205
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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