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Method of making an ion beam sputter-etched ventricular catheter for hydrocephalus shuntThe centricular catheter comprises a multiplicity of inlet microtubules. Each microtubule has both a large opening at its inlet end and a multiplicity of microscopic openings along its lateral surfaces. The microtubules are perforated by an ion beam sputter etch technique. The holes are etched in each microtubule by directing an ion beam through an electro formed mesh mask producing perforations having diameters ranging from about 14 microns to about 150 microns. This structure assures a reliable means for shunting cerebrospinal fluid from the cerebral ventricles to selected areas of the body.
Document ID
19840015027
Document Type
Other - Patent
Authors
Banks, B. A. (NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 4, 2013
Publication Date
February 21, 1984
Subject Category
AEROSPACE MEDICINE
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-LEW-13107-2|US-PATENT-4,432,853
Patent Application
US-PATENT-APPL-SN-444124

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