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Excimer laser annealing to fabricate low cost solar cellsThe objective is to show whether or not pulsed excimer laser annealing (PELA) of ion-implanted junctions is a cost effective replacement for diffused junctions in fabricating crystalline silicon solar cells. The preliminary economic analysis completed shows that the use of PELA to fabricate both the front junction and back surface field (BSF) would cost approximately 35 cents per peak watt (Wp), compared to a cost of 15 cents/Wp for diffusion, aluminum BSF and an extra cleaning step in the baseline process. The cost advantage of the PELA process depends on improving the average cell efficiency from 14% to 16%, which would lower the overall cost of the module by about 15 cents/Wp. An optimized PELA process compatible with commercial production is to be developed, and increased cell efficiency with sufficient product for adequate statistical analysis demonstrated. An excimer laser annealing station was set-up and made operational. The first experiment used 248 nm radiation to anneal phosphorus implants in polished and texture-etched silicon.
Document ID
19840025956
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Date Acquired
September 4, 2013
Publication Date
July 1, 1984
Subject Category
Energy Production And Conversion
Report/Patent Number
QR-10092-01
QR-1
NASA-CR-173938
DOE/JPL-956797-01
NAS 1.26:173938
JPL-9950-936
Report Number: QR-10092-01
Report Number: QR-1
Report Number: NASA-CR-173938
Report Number: DOE/JPL-956797-01
Report Number: NAS 1.26:173938
Report Number: JPL-9950-936
Accession Number
84N34027
Funding Number(s)
CONTRACT_GRANT: JPL-956797
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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