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Reduction to Outside the Atmosphere and Statistical Tests Used in Geneva PhotometryConditions for creating a precise photometric system are investigated. The analytical and discriminatory potentials of a photometry obviously result from the localization of the passbands in the spectrum; they do, however, also depend critically on the precision attained. This precision is the result of two different types of precautions. Two procedures which contribute in an efficient manner to achieving greater precision are examined. These two methods are known as hardware related precision and software related precision.
Document ID
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Rufener, F.
(Geneva Univ. Geneva, Switzerland)
Date Acquired
August 12, 2013
Publication Date
November 1, 1984
Publication Information
Publication: NASA. Ames Research Center. Proc. of the Workshop on Improvements to Photometry
Subject Category
Accession Number
Distribution Limits
Work of the US Gov. Public Use Permitted.
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