Reduction to Outside the Atmosphere and Statistical Tests Used in Geneva Photometry

Conditions for creating a precise photometric system are investigated. The analytical and discriminatory potentials of a photometry obviously result from the localization of the passbands in the spectrum; they do, however, also depend critically on the precision attained. This precision is the result of two different types of precautions. Two procedures which contribute in an efficient manner to achieving greater precision are examined. These two methods are known as hardware related precision and software related precision.