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Deposition of diamondlike carbon filmsA diamondlike carbon film is deposited in the surface of a substrate by exposing the surface to an argon ion beam containing a hydrocarbon. The current density in the ion beam is low during initial deposition of the film. Subsequent to this initial low current condition, the ion beam is increased to full power. At the same time, a second argon ion beam is directed toward the surface of the substrate. The second ion beam has an energy level much greater than that of the ion beam containing the hydrocarbon. This addition of energy to the system increases mobility of the condensing atoms and serves to remove lesser bound atoms.
Document ID
19850011843
Document Type
Other - Patent
Authors
Mirtich, M. J. (NASA Lewis Research Center Cleveland, OH, United States)
Sovey, J. S. (NASA Lewis Research Center Cleveland, OH, United States)
Banks, B. A. (NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
August 12, 2013
Publication Date
December 25, 1984
Subject Category
ENGINEERING (GENERAL)
Report/Patent Number
NAS 1.71:LEW-14080-1
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-LEW-14080-1|US-PATENT-4,490,229
Patent Application
US-PATENT-APPL-SN-628866

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