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A computer simulation of thin film nucleation and growth: The Volmer-Weber caseThe computer simulation of thin film nucleation and growth, which was previously performed for the case of single monolayer, was modified to include multilayer growth via the Volmer-Weber mechanism. The simulation results show that: (1) the kinetics of multilayer film growth is nearly identical to that of monolayer growth; (2) when no reevaporation takes place, the cluster density resulting from multilayer growth is higher at high coverage than that resulting from monolayer growth; (3) when reevaporation does take place, the cluster density resulting from multilayer growth is nearly identical to that resulting from monolayer growth. This is not due, however, to similarity in microstructure.
Document ID
19850012954
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Salik, J.
(NASA Lewis Research Center Cleveland, OH, United States)
Ghose, H. M.
(Cuyahoga Community Coll.)
Date Acquired
September 5, 2013
Publication Date
January 1, 1985
Subject Category
Chemistry And Materials (General)
Report/Patent Number
NAS 1.15:86968
NASA-TM-86968
E-2493
Report Number: NAS 1.15:86968
Report Number: NASA-TM-86968
Report Number: E-2493
Meeting Information
Meeting: Intern. Conf. on Met. Coatings
Location: Los Angeles, CA
Country: United States
Start Date: April 15, 1985
End Date: April 19, 1985
Sponsors: American Vacuum Society
Accession Number
85N21264
Funding Number(s)
PROJECT: RTOP 506-53-1B
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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