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Solid/melt interface studies of high-speed silicon sheet growthRadial growth-rate anisotropies and limiting growth forms of point nucleated, dislocation-free silicon sheets spreading horizontally on the free surface of a silicon melt have been measured for (100), (110), (111), and (112) sheet planes. Sixteen-millimeter movie photography was used to record the growth process. Analysis of the sheet edges has lead to predicted geometries for the tip shape of unidirectional, dislocation-free, horizontally growing sheets propagating in various directions within the above-mentioned planes. Similar techniques were used to study polycrystalline sheets and dendrite propagation. For dendrites, growth rates on the order of 2.5 m/min and growth rate anisotropies on the order of 25 were measured.
Document ID
19850016214
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Ciszek, T. F.
(Midwest Research Inst. Golden, CO, United States)
Date Acquired
September 5, 2013
Publication Date
February 1, 1984
Subject Category
Energy Production And Conversion
Report/Patent Number
NASA-CR-175698
DOE/JPL-W08746-83-1
NAS 1.26:175698
QTPR-1
SERI/PR-212-2196
Report Number: NASA-CR-175698
Report Number: DOE/JPL-W08746-83-1
Report Number: NAS 1.26:175698
Report Number: QTPR-1
Report Number: SERI/PR-212-2196
Accession Number
85N24525
Funding Number(s)
CONTRACT_GRANT: DE-AC02-83CH-10093
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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